Course #62
IC Debug and Fault Isolation
New date to be decided
TECHNOLOGY FOCUS
Growing IC complexity, especially in a fabless or foundry
environment, leads to functionality, yield, or reliability failures
that directly affect time-to-market and serviceability. Rapid,
definitive root cause determination is realized only through a
proactive design, test, and packaging strategy optimized to quickly
and accurately diagnose and isolate faults for subsequent failure
analysis and corrective action.
Once the domain of a small handful of simple test and failure
analysis techniques, this critical field now relies on strong
synergy between four key areas: design, test, packaging, and fault
isolation - the latter now comprised of a wide array of new,
sophisticated electrical and physical instruments and techniques
heavily dependent on the first three. The ultimate success of this
key element of development and manufacturing hinges on a design,
test, and packaging strategy that leverages the capabilities of
these new methods while taking into account their dependencies and
limitations.
COURSE CONTENT
This course will provide:
- Overview of the debug and fault isolation business and
technical environment
- Brief summary of test methodologies and common semiconductor
failure mechanisms
- Understanding of leading-edge debug and fault isolation
instruments and methods including photonic, thermal, magnetic,
electron, ion beam, and x-ray microscopy
- Review of common semiconductor package types and their
compatibility with fault isolation techniques
- Case histories and examples
- Guidance on implementing a proactive process for successful
debug
- Future challenges.
WHO SHOULD ATTEND
This course is a thorough introduction for technicians
and engineers working directly in quality / reliability, test, and
failure analysis, and will also be of value to program managers
responsible for quality, sourcing, and procurement in both captive
semiconductor fabricator and fabless/foundry
environments.
Wednesday
The Business and Technical Environment for Debug
and Fault Isolation
The role of debug and fault isolation in IC development
and manufacturing is described with an overview of debug
strategies, including technical issues and business impacts. Common
electrical failure modes and test methodologies for VLSI packages
and logic, memory, ASIC, microprocessor, analog, and mixed signal
chips are presented and categorized. Most importantly the value of
early communication and a design-for-debug strategy between and
among stakeholders is emphasized to minimize lost time and expense
and maximize supply servicability and customer satisfaction.
Package Level Debug and Fault Isolation
Time-domain reflectometry, thermal and magnetic field
imaging, and X-ray tomography are critical methods covered for
non-destructively debugging and isolating failures in single and
multi-chip and multi-layer VLSI packages.
Die Level Debug and Fault Isolation Overview
A summary of electrical and physical techniques is
presented as a precursor to understanding and solidifying the need
for a proactive approach. Electrical test and deterministic
diagnostic techniques are covered including memory bit-mapping,
scan-based logic analysis, IDDq testing, and analog circuit
analysis. Physical methods using photonic, magnetic, thermal, and
X-ray imaging and related infrastructure are briefly discussed as
both complement and supplement to the electrical methods. Finally,
the entire process, dependencies, and limitations are detailed
before understanding the major steps in greater depth.
Electrical Diagnostic Techniques
Capabilities of deterministic scan-based diagnosis and
bitmap approaches are examined as mainstream methods for isolating
problems in logic and memory devices, respectively. IDDq and analog
circuit analysis are also introduced as less rigorous but
nonetheless critical diagnostic solutions. Resolution and accuracy
limitations are explored in the context subsequent technical and
business impacts.
Thursday
Package and Test Preparation for Physical Fault
Isolation
VLSI packaging is rapidly increasing in density - what
used to be a simple means of interconnect to the outside world has
become a complex device of its own. Preparing a packaged chip for
non-destructive debug and fault isolation requires numerous
techniques preserving functionality and form-factor as much as
possible while retaining heat dissipating ability and allowing
access to internal nodes and films. Laser ablation, milling,
surface grinding and micromachining methods are examined along with
test fixturing.
Physical Fault Isolation Principles
Electrical fault isolation techniques are by nature
limited in spatial resolution
to the area energized - a logic node or a memory cell for example.
For many nanoscale defects and subtle non-visual defects this level
of isolation is insufficient. Often electrical debug capability is
limited or not available at all. Physical fault isolation uses
physical effects of faulty devices and circuits, materials, and
interconnects to provide spatial domain images of photonic,
thermal, and magnetic field interaction that aid in pinpointing
problematic regions.
Properties such as photocarrier absorption, magnetic field
density, local temperature gradient, and electroluminescence are
used with electrical test and high-resolution microscopy to image
and characterize the operation of functioning devices and defective
circuits. Methods include laser scanning microscopy, magnetic field
imaging, photon emission microscopy (PEM), passive voltage contrast
(PVC), and optical and electron beam induced current (OBIC/EBIC)
imaging.
Proactive Approach to Successful Debug
Planning, communication, and interaction between
stakeholders are important in ensuring success when problems arise.
Class material will be reviewed and synthesized into a process for
ensuring the best possible plan for debug and fault isolation.
Future Challenges
Recurring design and material changes in IC technology
are constantly challenging the techniques described. A brief
outlook of major debug and fault isolation obstacles is offered
with likely impacts assessed and necessary research paths
outlined.
Said
about the course from previous participants:
"Practical solutions for problems in industry."
"The good explanation of the first reliability part. Mixture of
the lecture with practical aspects, how to apply the concepts ands
formulas."
"The technical preparation of the teacher and his human
approach."
"Very open - easy to ask questions. Not too specific i e the
course relates to microelectronics in general and not just specific
devices."
"Broad coverage, balance between theory and real world examples.
"