PhD, LTM/CNRS, Grenoble, France.
Dr Cunge received his PhD degree in physics from Grenoble
University in 1997, working on the development of optical and
electrical plasma diagnostics to analyse the plasma-surface
interactions in fluorocarbon plasmas (that are widely used in
microelectronics manufacturing). In 1998, he spent one year in the
Plasma Research Laboratory at Dublin City University (Ireland) as a
Postdoc, where he studied capacitive to inductive mode transitions
and collisionless electron heating mechanisms in high-density
plasma reactors. In 1999 he returned to Grenoble University where
he engaged in teaching. Dr Cunge joined Olivier Joubert's group at
the Laboratoire des Technologies de la Microélectronique (LTM)
created by the CNRS in 1999 receiving tenure in 2000. At the LTM
Dr. Cunge works on the optimization and characterization of plasma
processes of new materials integrated in advanced CMOS devices. His
current research is dedicated to plasma-reactor walls interaction,
focusing on the issue of plasma process reproducibility. The work
at the LTM is carried out in close collaboration between CNRS, LETI
and the Alliance (STMicroelectronics, Philips and Freescale).
Dr Cunge has authored and co-authored more than 35 papers and
holds two patents in the field of plasma processing and
diagnostics.
Dr Cunge has been a member of the CEI-Europe Faculty since
2007.
Course #36
Silicon Device Technology: Materials and Processing Overview
Course #87
Plasma-Assisted Etching Using High and Low Density Plasmas and Ion
Beams