Dr Maxime Darnon received his M. Sc. and Ph. D.
from Grenoble University, France, in 2007.
He worked then as a research engineer at IMEC, Leuven, Belgium,
and as a research staff member in the advanced plasma group of IBM
Research in the T. J. Watson Research Center in Yorktown Heights,
NY, USA. His work mostly focused on plasma processes for
microelectronics interconnects. In 2009, he joined the French
institute for scientific research (CNRS) as a researcher assigned
to the Laboratory of Technologies of Microelectronics (LTM), where
he works on new plasma processes for microelectronics applications.
Dr Darnon is member of the CSTIC and PESM conferences committee and
has co-authored more than 20 publications, conference proceedings
and patents.
Dr. Darnon is a member of the CEI-Europe faculty as of 2011.
Course
#88
Plasma Etching for CMOS Technology and ULSI
Applications