Dr. Maxime Darnon, LN2/CNRS, Sherbrooke,
Dr. Darnon received his M. Sc. and Ph.D. from Grenoble
University, France, in 2007.
Dr. Darnon then worked as a research engineer at IMEC, Leuven,
Belgium, and as a research staff member in the advanced plasma
group of IBM Research in the T. J. Watson Research Center in
Yorktown Heights, NY, USA.
His work mostly focused on plasma processes for microelectronics
interconnects. In 2009, he joined the French institute for
scientific research (CNRS) as a researcher assigned to the
Laboratory of Technologies of Microelectronics (LTM), where he
worked on new plasma processes for microelectronics
Since 2015, he is assigned to CNRS/LN2 (Laboratory of
Nanotechnologies and Nanosystems) at Université de Sherbrooke,
Canada, where he uses plasma processes to improve solar cells and
integrated circuits packaging performance.
Dr. Darnon is member of the CSTIC, SPIE-AL, PESM and JNTE
conference committees and has co-authored more than 80
publications, books, conference proceedings and patents.
Dr. Darnon has been a member of the CEI-Europe faculty since
Plasma Etching for CMOS Technology and ULSI