PhD, IMEC, Leuven, Belgium.
In 2001, Roel Gronheid received his Ph.D. in
Photochemistry from Leiden University, The Netherlands, and had a
post-doctoral position at the Catholic University of Leuven
afterwards. He joined IMEC in 2003, where he specializes in
advanced resist technologies within the lithography department. He
has been actively involved in IMEC's 157nm, 193nm immersion and EUV
lithography research programs and has authored and co-authored over
60 publications and technical conference presentations. He
currently manages the work on resist fundamentals in IMEC's
lithography affiliation program.
Dr. Gronheid has been a member of the CEI-Europe Faculty since
Advanced Lithography Technologies - Fundamentals and
Silicon Device Technology: Materials and Processing