PhD, Director of Research at CNRS, France.
Dr Joubert received the PhD degree from Grenoble University in
France. He has been involved in collaborative research programs
between CNRS and the Microelectronic research center of France
Telecom and spent two years working in plasma etching groups at
Bell Labs, New Jersey and IBM Yorktown Heights, New York.
Dr Joubert started the "Laboratoire des Technologies de la
Microelectronique" at CNRS, where joint research programs are
conducted with LETI and STMicroelectronics in the field of plasma
processes, advanced lithography and new materials for micro and
nano devices. His current research is dedicated to the optimization
and characterization of plasma processes of new materials
integrated in advanced CMOS devices. Dr Joubert has authored more
than 100 publications in the open literature and given over 30
invited talks in international conferences. He has also served as
conference organizer for the Micro and Nano Engineering conference
and in the scientific committees of the American Vacuum Society
conference (USA), Dry Process Symposium (Japan), SPIE (USA), and
ESSDERC (Europe).
Dr Joubert has been a member of the CEI-Europe Faculty since
2003.
Course #88
Plasma Etching for CMOS Technology and ULSI
Applications