Joubert, Olivier - CEI-Europe

Joubert, Olivier

PhD, Director of Research at CNRS, France.

Dr Joubert received the PhD degree from Grenoble University in France. He has been involved in collaborative research programs between CNRS and the Microelectronic research center of France Telecom and spent two years working in plasma etching groups at Bell Labs, New Jersey and IBM Yorktown Heights, New York.

Dr Joubert started the "Laboratoire des Technologies de la Microelectronique" at CNRS, where joint research programs are conducted with LETI and STMicroelectronics in the field of plasma processes, advanced lithography and new materials for micro and nano devices. His current research is dedicated to the optimization and characterization of plasma processes of new materials integrated in advanced CMOS devices. Dr Joubert has authored more than 100 publications in the open literature and given over 30 invited talks in international conferences. He has also served as conference organizer for the Micro and Nano Engineering conference and in the scientific committees of the American Vacuum Society conference (USA), Dry Process Symposium (Japan), SPIE (USA), and ESSDERC (Europe).

Dr Joubert has been a member of the CEI-Europe Faculty since 2003.

Course #88 Plasma Etching for CMOS Technology and ULSI Applications

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