PhD, IBM Fellow Emeritus, Consulting Services, Monterey,
CA, USA.
Until 2002, Dr. Pfeiffer was with the IBM Corporation.
During his career he established a world class team and played a
leading role in the development of IBM's state-of-the-art E-Beam
lithography systems. He is recognized for building the industry's
first shaped beam lithography systems. His work provided the
technological base for IBM's five generations of high throughput
exposure tools, EL-1...El-5. More recently, Dr. Pfeiffer invented
and pioneered PREVAIL, IBM's E-Beam Projection approach for Next
Generation Lithography. Dr. Pfeiffer received his Ph.D. from the
Technical University of Berlin, Germany. His activities in electron
optics, electron beam physics and electron beam lithography are
recorded in more than 130 publications and 27 issued or pending
patents. He has received numerous IBM awards for his Inventions and
for Outstanding Innovation, and was a member of the IBM Academy of
Technology.
Dr. Pfeiffer has been a member of the CEI-Europe Faculty since
1997.
Course #05
Current and Next Generation Lithography - Fundamentals and
Applications