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Pfeiffer, Hans C.

PhD, IBM Fellow Emeritus, Consulting Services, Monterey, CA, USA.

Until 2002, Dr. Pfeiffer was with the IBM Corporation. During his career he established a world class team and played a leading role in the development of IBM's state-of-the-art E-Beam lithography systems. He is recognized for building the industry's first shaped beam lithography systems. His work provided the technological base for IBM's five generations of high throughput exposure tools, EL-1...El-5. More recently, Dr. Pfeiffer invented and pioneered PREVAIL, IBM's E-Beam Projection approach for Next Generation Lithography. Dr. Pfeiffer received his Ph.D. from the Technical University of Berlin, Germany. His activities in electron optics, electron beam physics and electron beam lithography are recorded in more than 130 publications and 27 issued or pending patents. He has received numerous IBM awards for his Inventions and for Outstanding Innovation, and was a member of the IBM Academy of Technology.

Dr. Pfeiffer has been a member of the CEI-Europe Faculty since 1997.

Course #05 Current and Next Generation Lithography - Fundamentals and Applications

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