Ph.D., IMEC, Leuven, Belgium.
Dr. Ronse currently holds the position of lithography
department director at IMEC.
He joined the lithography group in IMEC in 1990, specializing in
the field of phase shifting masks, off-axis illumination techniques
and CD control optimization for 365nm and 248nm lithography. Dr.
Ronse received his Ph.D. in Electrical Engineering from the
University of Leuven, Belgium. He has authored and co-authored over
60 publications and conference contributions in the field of
optical lithography, and is a member of the technical program
committee of several international lithography conferences. He has
been project leader in several European projects under the Esprit,
Jessi, IST, and Medea framework.
Dr. Ronse has been a member of the CEI-Europe Faculty since
Dr. Ronse and Dr. Gronheid are both part of the lithography
department at IMEC and take turns in teaching courses #05 and
Current and Next Generation Lithography
- Fundamentals and Applications
Silicon Device Technology: Materials and Processing