Ph.D., IMEC, Leuven, Belgium.

Dr. Ronse currently holds the position of lithography department director at IMEC.

He joined the lithography group in IMEC in 1990, specializing in the field of phase shifting masks, off-axis illumination techniques and CD control optimization for 365nm and 248nm lithography. Dr. Ronse received his Ph.D. in Electrical Engineering from the University of Leuven, Belgium. He has authored and co-authored over 60 publications and conference contributions in the field of optical lithography, and is a member of the technical program committee of several international lithography conferences. He has been project leader in several European projects under the Esprit, Jessi, IST, and Medea framework.

Dr. Ronse has been a member of the CEI-Europe Faculty since 1999.

Dr. Ronse and Dr. Gronheid are both part of the lithography department at IMEC and take turns in teaching courses #05 and #36.

Course #05 Current and Next Generation Lithography - Fundamentals and Applications

Course #36 Silicon Device Technology: Materials and Processing Overview