Wege, Stephan - CEI-Europe

Wege, Stephan

Diplom Physicist, Head of plasway plasma-consulting, Germany.

Mr. Wege started his carrer at the Fraunhofer Institut for Silicon Technology in Berlin 1990 and continued to the University of Karlsruhe in 1994.  He has held several postions with Siemens Microelectronic Center Dresden, as process engineer for gate stack etching in the Joint venture between IBM and Siemens in Corbeile-Essonnes including the transfer and start-up of a 200mm line.

Between 1998 and 2004 Mr. Wege held positions within Infineon Technologies, Germany /FabCluster Organization, working with coordination of World Wide Dry Etch Activities in the US, Taiwan, and Germany, planning and organizing 300mm production fabs as well as with their memory development center. From 2004 to 2009 he was with Qimonda Dresden and since then Mr. Wege is working as an independent consultant in Semiconductor-, Solar-and the MEMS Industry.
Mr. Wege is a new participant of the CEI-Europe Faculty as of 2015.

Mr. Wege started his carrer at the Fraunhofer Institut for Silicon Technology in Berlin 1990 and continued to the University of Karlsruhe in 1994.  He has held several postions with Siemens Microelectronic Center Dresden, as process engineer for gate stack etching in the Joint Venture between IBM and Siemens in Corbeile-Essonnes, including the transfer and start-up of a 200mm line.

Between 1998 and 2004 Mr. Wege held positions within Infineon Technologies, Germany /FabCluster Organization, working with coordination of world wide dry etch activities in the US, Taiwan, and Germany, planning and organizing 300mm production fabs as well as with their memory development center. From 2004 to 2009 he was with Qimonda Dresden and since then Mr. Wege is working as an independent consultant in the Semiconductor-, Solar-and MEMS Industry.

Mr. Wege is a new member of the CEI-Europe Faculty as of 2015.

Course #36 Silicon Device Technology: Materials and Processing Overview

 

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