Dr Cunge received his PhD degree in physics from Grenoble University in 1997, working on the development of optical and electrical plasma diagnostics to analyse the plasma-surface interactions in fluorocarbon plasmas (that are widely used in microelectronics manufacturing). In 1998, he spent one year in the Plasma Research Laboratory at Dublin City University (Ireland) as a Postdoc, where he studied capacitive to inductive mode transitions and collisionless electron heating mechanisms in high-density plasma reactors. In 1999 he returned to Grenoble University where he engaged in teaching. Dr Cunge joined Olivier Joubert's group at the Laboratoire des Technologies de la Microélectronique (LTM) created by the CNRS in 1999 receiving tenure in 2000. At the LTM Dr. Cunge works on the optimization and characterization of plasma processes of new materials integrated in advanced CMOS devices. His current research is dedicated to plasma-reactor walls interaction, focusing on the issue of plasma process reproducibility. The work at the LTM is carried out in close collaboration between CNRS, LETI and the Alliance (STMicroelectronics, Philips and Freescale).
Dr Cunge has authored and co-authored more than 35 papers and holds two patents in the field of plasma processing and diagnostics.
Dr Cunge has been a member of the Continuing Education Institute-Europe Faculty since 2007.
Course 036 Silicon Device Technology: Materials and Processing Overview Course 087 Plasma-Assisted Etching Using High and Low Density Plasmas and Ion Beams