Instructor profile Dr. Maxime Darnon

Dr Maxime Darnon

LN2/CNRS, Sherbrooke, Canada

Dr. Darnon received his M. Sc. and Ph.D. from Grenoble University, France, in 2007.

Dr. Darnon then worked as a research engineer at IMEC, Leuven, Belgium, and as a research staff member in the advanced plasma group of IBM Research in the T. J. Watson Research Center in Yorktown Heights, NY, USA. His work mostly focused on plasma processes for microelectronics interconnects.

In 2009, he joined the French institute for scientific research (CNRS) as a researcher assigned to the Laboratory of Technologies of Microelectronics (LTM), where he worked on new plasma processes for microelectronics applications.

Since 2015, he is assigned to CNRS/LN2 (Laboratory of Nanotechnologies and Nanosystems) at Université de Sherbrooke, Canada, where he uses plasma processes to improve solar cells and integrated circuits packaging performance.

Dr. Darnon is member of the CSTIC, SPIE-AL, PESM and JNTE conference committees and has co-authored more than 80 publications, books, conference proceedings and patents.

Dr. Darnon has been a member of the Continuing Education Institute-Europe faculty since 2011.

Course 088 Plasma Etching for CMOS Technology and ULSI Applications.