Dr. Maxime Darnon, LN2/CNRS, Sherbrooke, Canada is teaching this 4-day course in Plasma Etching for CMOS Technology and ULSI Applications.

This course is intended to provide an understanding of plasma processes for CMOS applications and ULSI technology. We will discuss fundamental and practical aspects of front end and back end plasmaprocesses for deep submicron CMOS logic processes.  

The course is based on experimental results obtained using commercial etchers connected to very powerful diagnostics of the plasma and the plasma surface interaction.

The discussions cover several aspectsof etch processes of materials integrated in advanced CMOS devices,etch mechanisms, and situations that may be encountered for some important plasma processes.

Due to Covid-19, and the uncertain travel recommendations for Autumn 2020, it is decided that this course is planned to run Online only. The daily schedule will be adjusted to fit remote training, with less hours per day divided into extra days. Make a preliminary booking and we will keep you updated.

Course Content
Course 088 Plasma Etching for CMOS Technology and ULSI Applications
Seat Reservation
November 30 - December 03, 2020

No payment now. We will contact you for firm registration in good time before course date.

Early Bird €2,665.00 Regular Price €2,965.00

Early Bird Price valid until: Oct 05, 2020

Instructor Dr. Maxime Darnon Element
Dr. Maxime Darnon

PhD at LN2/CNRS, Sherbrooke, Canada.

Dr. Darnon has been a member of the Continuing Education Institute-Europe faculty since 2011.

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