Overview

Dr. Maxime Darnon, LN2/CNRS, Sherbrooke, Canada is teaching this 4-day course in Plasma Etching for CMOS Technology and ULSI Applications.

This course is intended to provide an understanding of plasma processes for CMOS applications and ULSI technology. We will discuss fundamental and practical aspects of front end and back end plasmaprocesses for deep submicron CMOS logic processes.  

The course is based on experimental results obtained using commercial etchers connected to very powerful diagnostics of the plasma and the plasma surface interaction.

The discussions cover several aspectsof etch processes of materials integrated in advanced CMOS devices,etch mechanisms, and situations that may be encountered for some important plasma processes.

Due to Covid-19, and the uncertain travel recommendations for Autumn 2020, it is decided that this course is planned to run Online only. The daily schedule will be adjusted to fit remote training, with less hours per day divided into extra days. Make a preliminary booking and we will keep you updated.

Course Content
Course 088 Plasma Etching for CMOS Technology and ULSI Applications
Location
Date
Seat Reservation
This course is currently not scheduled. If interested in the topic, please send us an email at cei@cei.se
Instructor
Instructor Dr. Maxime Darnon Element
Dr. Maxime Darnon

PhD at LN2/CNRS, Sherbrooke, Canada.

Dr. Darnon has been a member of the Continuing Education Institute-Europe faculty since 2011.

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