Dr. Henk W. van Zeijl / Delft University of Technology, The Netherlands is teaching this 5-day course on Applied I-line Lithography
Microelectronic products and systems are vital to our modern world, powering everything from lightweight consumer devices like mobile phones to high-power industrial applications such as automotive electronics and aerospace systems. Central to these systems are integrated circuits (ICs), fabricated using planar processing technology that relies heavily on precise patterning techniques. As the demand for greater functionality at lower costs increases—a trend driven by Moore’s Law—the complexity and density of patterning have grown significantly. Optical lithography has been the cornerstone of this advancement, enabling feature sizes to shrink from 10 micrometers in the 1970s to just a few nanometers today.
This course emphasizes hands-on experience in a state-of-the-art cleanroom environment, where practical experiments are conducted to deepen understanding of lithographic processes. Participants will explore the complete CMOS process flow, understand lithography’s role in device performance, and examine its applications in micro-system technology and advanced packaging. Designed for engineers, researchers, and students, this course provides essential expertise in lithographic techniques, preparing attendees for challenges in IC fabrication, system integration, and innovation in microelectronics.
